Dual-Adjustment Precision Linear Stage – Vernier & Micrometer
A compact precision linear positioning stage designed to provide controlled linear movement using both vernier-scale adjustment and micrometer-based fine adjustment.
The stage can be used as a mounting platform for applications requiring precise positioning and alignment. The base stage provides controlled movement, while the upper platform can accommodate a micrometer mechanism for fine positioning and adjustment.
Files (4)
License:
CC - Attribution
Learn more
Published